The paper presents certain results of a study of the structural features of thin tungsten films, sputtered by an oscillating - electrons discharge. The sputtering was onto two types of substrate: glass and NaCl. The suggested sputtering system makes it possible to sputter and investigate several films at the same time. The chemical composition of the sputtered metals as well as of the resulting films is analyzed by Auger spectroscopy. The film structure is determined, and the lattice parameters are calculated with an aid of a transmission electron microscope.
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