Structural and magnetic properties of nickel films deposited from oscillating-electron discharge under low-energy krypton ion irradiation

Tl1e structural and magnetic parameters of Ni films obtained from a discharge with oscillating electrons are shown to depend on the energy of $Кr^+$ ions bombarding the film in the course of deposition. The shape of the energy dependence is explained by several factors, including the presence of discrete ionization regions in the discharge, the elastic and inelastic interactions of $Кr^+$ ions with the film surface, the ratio of fluxes of Ni atoms and $Кr^+$ ions in the two discharge regimes studied, and the difference in the character of ion interaction with the fee and hep phases of nickel.