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Structural and magnetic properties of nickel films deposited from oscillating-electron discharge under low-energy krypton ion irradiation

G.V. Smirnitskaya, S.V. Sveshnikov, L.V. Nikitin, D.M. Gazdiev, E.V. Likhushina, L.S. Mironova, T.I. Udilina

Moscow University Physics Bulletin 1993. 48. N 4. P. 71

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Annotation

Tl1e structural and magnetic parameters of Ni films obtained from a discharge with oscillating electrons are shown to depend on the energy of $Кr^+$ ions bombarding the film in the course of deposition. The shape of the energy dependence is explained by several factors, including the presence of discrete ionization regions in the discharge, the elastic and inelastic interactions of $Кr^+$ ions with the film surface, the ratio of fluxes of Ni atoms and $Кr^+$ ions in the two discharge regimes studied, and the difference in the character of ion interaction with the fee and hep phases of nickel.

Rissian citation:
Г.В. Смирницкая, С.В. Свешников, Л.В. Никитин, Д.М. Газдиев, Е.В. Лихушина, Л.С. Миронова, Т.И. Удилина.
Структура и магнитные свойства пленок никеля, полученных в разряде с осциллирующими электронами при бомбардировке ионами криптона низкой энергии.
Вестн. Моск. ун-та. Сер. 3. Физ. Астрон. 1993. № 4. С. 79.
Authors
G.V. Smirnitskaya, S.V. Sveshnikov, L.V. Nikitin, D.M. Gazdiev, E.V. Likhushina, L.S. Mironova, T.I. Udilina
Department of General Physics for Natural Science Faculties, Faculty of Physics, Moscow State University, Leninskie Gory, Moscow, 119992, Russia
Issue 4, 1993

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