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Influence of polar Langmuir-Blodgett films on slow states of silicon surface

N.L. Levshin$^1$, S.G. Yudin$^2$

Moscow University Physics Bulletin 1999. 54. N 5. P. 34

  • Article
Annotation

The influence of polar Langmuir-Blodgett films on the recharge of slow silicon surface states in a vacuum and in atmospheric water vapor has been studied. The deposition of a copolymer film has been shown to decrease silicon surface heterogeneity. The forms of kinetic dependence of the recharge of slow states have been analyzed. The results obtained are interpreted in terms of the electron-vibrational model of slow charge relaxation on the semiconductor surface.

Authors
N.L. Levshin$^1$, S.G. Yudin$^2$
$^1$Department of General Physics and Molecular Electronics, Faculty of Physics, Moscow State University, Leninskie Gory, Moscow, 119992, Russia
$^2$Shubnikov Institute of Crystallography, Russian Academy of Sciences
Issue 5, 1999

Moscow University Physics Bulletin

Science News of the Faculty of Physics, Lomonosov Moscow State University

This new information publication, which is intended to convey to the staff, students and graduate students, faculty colleagues and partners of the main achievements of scientists and scientific information on the events in the life of university physicists.