An approach to the design of holograms and masks for optical lithography is proposed on the basis of digitizing an image and dividing the sample into three phase components defined on a special bitmap. The equivalence conditions of the continuous and discrete methods of specifying a transmission function are studied. Computer modeling is used to reconstruct the images generated by means of the discrete phase masks synthesized. The locality principle has proven to hold: the transmission function at a given mask point is determined by the position of the nearest aperture.
Department of Oscillation Physics, Faculty of Physics, Moscow State University, Leninskie gory, Moscow, 119992, Russia
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