Annotation
In this work, the structure and chemistry of thin nm-thick carbon films deposited on a substrate using strong 13.5 nm EUV irradiation under a strong vacuum were studied. The film structure was studied by Raman spectroscopy in comparison with the Raman spectra of well-known carbon phases: diamond, single-wall nanotubes, nano- and micro-crystalline graphite and amorphous carbon. As well, FTIR spectroscopy was used to study possible IR-active chemical bonds, primarily, hydrogen bonds. It was shown that films deposited on a surface under EUV irradiation consists of amorphous $sp^2$-carbon. The mechanisms of deposition are discussed briefly. Knowledge about the structure and chemistry of such carbon films is very important for EUV lithography.
Received: 2010 July 19
Approved: 2011 April 13
PACS:
81.15.Aa Theory and models of film growth
39.30.+w Spectroscopic techniques
39.30.+w Spectroscopic techniques
© 2016 Publisher M.V.Lomonosov Moscow State University
Authors
E.M. Malykhin, V.A. Krivchenko, D.V. Lopaev, T.V. Rakhimova, S.M. Zyryanov
Department of Microelectronics, Institute of Nuclear Physics, Moscow State University, Moscow, 119991, Russia
Department of Microelectronics, Institute of Nuclear Physics, Moscow State University, Moscow, 119991, Russia