The feasibility of plasma cleaning of the multilayer mirrors used in 13.5-nm EUV lithography from carbon contaminations is studied. Experiments conducted in electrodeless plasma of the surface-wave low-pressure discharge in helium and hydrogen demonstrated the high rate, efficiency, and selectivity of this cleaning without any damage of the mirror’s upper protection layer, even at the atomic level. The optimal working parameters of plasma cleaning are determined and its possible mechanism is discussed.
61.48.+c Fullerenes and fullerene-related materials
39.30.+w Spectroscopic techniques
82.20.-w Chemical kinetics and dynamics
Skobel’tsyn Institute of Nuclear Physics, Moscow State University, Moscow, 119992, Russia
Science News of the Faculty of Physics, Lomonosov Moscow State University
This new information publication, which is intended to convey to the staff, students and graduate students, faculty colleagues and partners of the main achievements of scientists and scientific information on the events in the life of university physicists.