Structural features of Al, Ti, Pd, and Ta films obtained in discharge with oscillating electrons

The structure of thin AI, Ti, Pd, and Ta films deposited on glass substrates in discharge with oscillating electrons in two discharge modes (different pressures and discharge currents) has been studied. Deposition and particle flow rates have been determined. The content of Kr in the films was found to be of the order of several tenths of percent. The structure studies have shown that the films had a pronounced texture; the diffraction pattern distorted in some directions was evidence of packing defects. The structure of light metal (Al and Ti) films was shown to depend on discharge conditions; no such dependence was observed for heavy metals (Pd and Ta). All films prepared in mode II were less defective than films prepared in mode I.