Annotation
The ion energy distribution function at an arbitrary point of a low-pressure discharge positive column has been calculated with regard to ions recharging. The calculations were performed for arbitrary relationships between the free path of ions,. the Debye radius, and the plasma size. The results can be used in designing technological plasma chambers for ionic etching and thin film deposition.
© 2016 Publisher M.V.Lomonosov Moscow State University
Authors
S.A. Dvinin, V.A. Dovzhenko, A.A. Kuzovnikov
Department of Physical Electronics, Faculty of Physics, Moscow State University, Leninskie Gory, Moscow, 119992, Russia
Department of Physical Electronics, Faculty of Physics, Moscow State University, Leninskie Gory, Moscow, 119992, Russia
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