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A method for rapidly estimating the thickness of nanometer film targets and its application in experiments on generation of picosecond X-ray pulses

V.M. Gordienko, A.B. Savel'ev, A.A. Shashkov

Moscow University Physics Bulletin 2000. 55. N 4. P. 51

  • Article
Annotation

A method for rapidly determining the thickness of nanometer dielectric films accurate to $\pm$2-3 nm is suggested. The method is a modification of the ellipsometric method and is based on Brewster angle measurements for light passing through film-substrate systems. The results are used in experiments on effective generation of soft X-rays in dangling superthin films exposed to $10^{16}$ W /cm$^2$ laser pulses.

Authors
V.M. Gordienko, A.B. Savel'ev, A.A. Shashkov
Department of General Physics and Wave Processes, Faculty of Physics, Moscow State University, Leninskie Gory, Moscow, 119992, Russia
Issue 4, 2000

Moscow University Physics Bulletin

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