Annotation
Considering the thermoelectret effect, the process of depolarization of a thin dielectric film exposed to electron beam has been studied. It is established that this effect increases the rate of decay of the potential on the target surface and the time of charge relaxation in the sample's bulk. It is shown that the thermoelectret effect can be used in indirect measurements of the electron-beam resist temperature in electron-beam lithography.
© 2016 Publisher M.V.Lomonosov Moscow State University
Authors
N.N. Negulyaev$^1$, S.I. Zaitsev$^2$, E.A. Grachev$^1$
$^1$Department of Computer Methods of Physics, Faculty of Physics, Moscow State University, Leninskie Gory, Moscow, 119992, Russia
$^2$Institute of Problems of Microelectronic Technology, Russian Academy of Sciences, Chernogolovka
$^1$Department of Computer Methods of Physics, Faculty of Physics, Moscow State University, Leninskie Gory, Moscow, 119992, Russia
$^2$Institute of Problems of Microelectronic Technology, Russian Academy of Sciences, Chernogolovka
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