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Electron transport in amorphous metal-carbon nanocomposite films

A.D. Bozhko$^1$, E.A. Kataeva$^2$, T. Takagi$^3$, M.G. Mikheev$^1$, M.B. Guseva$^2$

Moscow University Physics Bulletin 2007. 62. N 4. P. 229

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Annotation

The electrical conductivity of amorphous silicon- and oxygen-containing W-, Nb-, and Cr-carbon nanocomposite films is studied. It is revealed that, at a metal concentration of 10–40 at. % and in the temperature range 80–400 K, the electrical conductivity of the films is a power function of temperature. In terms of inelastic electron tunneling, the average number of localized states in the intercluster potential barriers is calculated as a function of the metal concentration.

Rissian citation:
А.Д. Божко, Е.А. Катаева, Т. Такаги, М.Г. Михеев, М.Б. Гусева.
Электронный транспорт в пленках аморфных металл-углеродных нанокомпозитов.
Вестн. Моск. ун-та. Сер. 3. Физ. Астрон. 2007. № 4. С. 26.
Authors
A.D. Bozhko$^1$, E.A. Kataeva$^2$, T. Takagi$^3$, M.G. Mikheev$^1$, M.B. Guseva$^2$
$^1$Department of Low Temperature Physics and Superconductivity, Faculty of Physics, Moscow State University, Leninskie gory, Moscow, 119992, Russia
$^2$Department of Physical Electronics, Faculty of Physics, Moscow State University, Leninskie gory, Moscow, 119992, Russia
$^3$Institute of Fluid Science, Tohoku University, Sendai, Japan
Issue 4, 2007

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